Encouraging Artistic Risk Taking through Film Policy – University of Copenhagen

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09 March 2012

Encouraging Artistic Risk Taking through Film Policy

Eva Novrup Redvall har artiklen 'Encouraging Artistic Risk Taking through Film Policy: The Case of New Danish Screen' i antologien Film and Risk, redigeret af Mette Hjort og udgivet af Wayne State University Press (marts 2012).

Bogen er nomineret til prisen for Best Edited Collection af Society of Cinema and Media Studies 2012.

Beskrivelse af bogen:

The phenomenon of risk has been seriously neglected in connection with the study of film, yet many of those who write about film seem to have intuitions about how various forms of risk-taking shape aspects of the filmmaking or film-viewing process. Film and Risk fills this gap as editor Mette Hjort and interdisciplinary contributors discuss film’s relation to all types of risk. Bringing together scholars from philosophy, anthropology, film studies, economics, and cultural studies, as well as experts from the fields of law, filmmaking, and photojournalism, this volume discusses risk from multiple intriguing angles.

In thirteen chapters, contributors consider concrete risks (e.g., stunts or financial decisions); theoretical aesthetic and artistic risks (e.g., filmmakers who incorporate excessive hazards into their films); and the real-world jeopardy spectators might put themselves in when viewing films. The first three chapters tackle the conceptual terrain that is relevant to understanding risk in film. The next three chapters focus on risk as it pertains to the practice of filmmaking. Subsequent chapters deal with economic risk and the role that risk has in the development of film’s institutional landscape. The scholarship in this collection is impressive, boasting some of the top writers in their respective fields. 

Through the contributors’ clear and thorough discussions, this cohesive but diverse collection shows that risk arises in many different areas that tend to be thought of as central to film studies. Scholars of film studies will appreciate this daring and inventive collection, and readers with a general interest in film studies will enjoy its accessible style.

Contributors: Jinhee Choi, Faye Ginsburg, Bill Grantham, Mette Hjort, Paisley Livingston, Sylvia J. Martin, Richard Maxwell, Toby Miller, Hamid Naficy, Michael Pokorny, Trevor Ponech, Eva Novrup Redvall, John Sedgwick, Rod Stoneman, Michelle L. Woodward

Published by Wayne State University Press

http://wsupress.wayne.edu/books/1168/Film-and-Risk